Document Type

Article

Version

Publisher's PDF

Publication Title

Applied Physics Letters

Volume

75

Publication Date

1999

Abstract

We measured at room temperature the photoluminescence spectra of the thermally oxidized Si1-x-yGexCy thin films which were grown on silicon substrates by plasma-enhanced chemical vapor deposition and the wet oxidized at 1100 °C for 20 min. The photoluminescence band with a peak at ~393 nm under the exciting radiation of λ = 241 nm was observed. Possible mechanism of this photoluminescence is discussed.

DOI

10.1063/1.125342

Included in

Physics Commons

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